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Automated sol'n optimises HB LED fabrication

Posted: 10 Feb 2012     Print Version  Bookmark and Share

Keywords:mask alignment system  high-brightness LED  UV light 

EV Group (EVG) offers the EVG620HBL, an automated mask alignment system that touts a high-intensity UV light source and five cassette stations to optimise the fabrication of high-brightness (HB) LEDs, compound semiconductors and power electronics.

The device claims to delivers throughput of up to 165 six-inch wafers per hour (up to 220 wafers per hour in first print mode). The company said that its device is in line with the expanding market of solid-state and general lighting applications, as well as signage, professional displays and stationary (non-vehicle) signals.


The EVG620HBL boasts fast HB-LED manufacture.

The company said it created the EVG620HBL aligner in response to customer demand for a mask alignment system dedicated to meeting increasing device yield and throughput requirements.

A key feature of the EVG620HBL is the availability of special recipe-controlled microscopes whose illumination spectrum is optimised to ensure the best pattern contrast with various wafer and layer materials. These include advanced substrate materials such as sapphire, silicon carbide (SiC), aluminium nitride (AlN), metal and ceramic.

The EVG620HBL is available for purchase.

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