Global Sources
EE Times-India
Stay in touch with EE Times India
EE Times-India > Manufacturing/Packaging

E-beam litho system features mask, direct-write apps

Posted: 26 Oct 2010     Print Version  Bookmark and Share

Keywords:electron-beam  lithography  mask writing  direct-write 

Vistec Electron Beam GmbH presents its electron-beam lithography system that features both mask writing and direct-write applications.

The platform supports Vistec's variable shaped beam (VSB) e-beam as well as its multi shaped beam (MSB) lithography system which is under development.

The e-beam is designed with a vacuum compatible air-bearing based positioning system to overcome the limitations of roller bearings for future performance requirements. This lets the company address mask writing as well as electron-beam direct write applications.

According to the company, "By applying MSB techniques, the substrate is exposed with an array of individually controlled shaped beams in parallel instead of a single shaped beam sequentially. The underlying technology continues to use the basic principle of shaped beams which significantly reduces the development risk and time."

- Mark LaPedus
EE Times

Comment on "E-beam litho system features mask, d..."
*  You can enter [0] more charecters.
*Verify code:


Visit Asia Webinars to learn about the latest in technology and get practical design tips.


Go to top             Connect on Facebook      Follow us on Twitter      Follow us on Orkut

Back to Top