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SMIC develops 110-nm CIS process

Posted: 27 Oct 2008     Print Version  Bookmark and Share

Keywords:CMOS image sensor  manufacturing process technology  110-nm process 

Foundry Semiconductor Manufacturing International Corp. (SMIC) has said it has successfully developed a 110-nm CMOS image sensor manufacturing process technology.

SMIC is offering the CMOS image sensor (CIS) foundry service in China and the latest process joins 0.18- and 0.15µm CIS technologies. The 110-nm process is available with both aluminium and copper backend metallisation, SMIC said. It is suitable for use in such applications as camera phones, computer cameras, and industrial and security monitoring devices. SMIC has begun pilot production of the process, which can be implemented on 200- and 300-mm diameter wafers.

"Using optimised process conditions, we've successfully reduced dark noise, enabling performance in low-light environments," said Paul Ouyang, SMIC vice president of marketing and sales.

-Peter Clarke
EE Times Europe

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