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Mentor, TSMC partner on physical verification solutions

Posted: 10 Oct 2008     Print Version  Bookmark and Share

Keywords:physical verification  Equation-Based DRC  PV flows 

TSMC and Mentor Graphics Corp. collaborated on physical verification (PV) solutions leveraging a new feature of the Calibre nmDRC product called "Equation-Based DRC."

Equation-Based DRC allows users to check and correct issues that are very difficult to perform today with classic DRC methods. Continuous multi-dimensional (2D, 3D) functions allow IC developers to implement DFM functionality directly within their PV flows.

TSMC has targeted general market availability of physical analysis decks supporting these new capabilities for its 32nm process technologies. "The advanced capability of Calibre Equation-Based DRC is that it allows designers to perform important physical verification checks that are difficult with other approaches," said S.T. Juang, senior director of design infrastructure marketing at TSMC. "Equation-Based DRC's ability to model complex DFM phenomena in a simple way allows TSMC to create advanced physical analysis decks and utilities to help designers achieve higher first-pass yield, and to accelerate their ramp to volume production."

Calibre customers can now incorporate complex manufacturing checks in a more accurate and straightforward manner with reduced PV deck size and improved designer debug productivity. Calibre customers employ equation-based DRC applications on the newest processes to address advanced lithography and manufacturability issues, and also on mature processes at 180nm and above in automotive, advanced mixed signal, and radio frequency applications. Other advanced-node applications that can be addressed using Equation-Based DRC include multi-dimensional compliance, poly corner rounding, gate uniformity, current density, and IR drop analysis and verification.

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