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EE Times-India
EE Times-India > EDA/IP

Design-manufacturing synergy will win yields in the nm era

Posted: 01 Mar 2008     Print Version  Bookmark and Share

Keywords:IC Design  manufacturing  automated technologies  nanometre 

Design has grown increasingly complex with the advent of the nanometre era. Yield success is much harder to achieve because of the increased number and complexity of variables affecting manufacturability. The designer's strategy must shift from simple design rule compliance to the definition and design of the optimal layout for the highest yield. There is a need to begin incorporating automated technologies that improve yield not only by correcting errors at the manufacturing stage, but also by enhancing the design itself.

This article discusses the incorporation of critical feature analysis, critical area modelling, and lithography variation analysis for designs to be in line with the manufacturing process.

View the PDF document for more information.

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