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Cornell-JEOL-Genisys upgrade nanostructure fab tech

Posted: 06 Jun 2007     Print Version  Bookmark and Share

Keywords:R&D partnership  nanostructure fabrication  fabrication process 

Genisys GmbH, JEOL Ltd and Cornell University's Nanoscale Science and Technology Facility has partnered to develop direct write e-beam data preparation and electron process correction technology for nanometre-range structures.

Genisys is a specialist developer of e-beam direct write software to optimise microstructure fabrication processes.

Working with JEOL, the German group is optimising its Layout Beamer data preparation and PEC software to maximise performance on the hardware vendor's high-end e-beam lithography systems.

Cornell Nanoscale Science and Technology Facility, one of the leading research facilities in the sector, is providing guidance on both implementation and development strategies, leveraging its work on nanostructures used in microelectronics, optics, biomedical applications and other functions.

Work on the three-party agreement, which has already started, is focusing on structures of some 10nm or less. The partners say these extremely small structures are fabricated with only a few pulses of the electron beam writer, creating a need for unprecedented uniformity, consistency and placement.

Findings of the Cornell-JEOL collaboration have already enabled upgrades of the GenISys software, which now includes an algorithm that corrects printing artifacts of this discrete writing grid. Future versions will be able to account for additional machine and process effects.

Genisys says its nano-EPC programme represents a "major advance over the 20-year-old software technology that has been used for e-beam data preparation and correction."

Ulrich Hofmann, founder and general manager of Genisys, commented: "These organisations are pioneering the state of the art in nano-fabrication and provide the ideal forum for further development and extension of Layout Beamer."

"The input we receive from the team at Cornell is a huge contribution to our development efforts. With GenISys as a partner, we will have more visibility into the data preparation side of nano-fabrication and will benefit from collaborating with their outstanding specialists," said Katsuya Watanabe, sales manager of JEOL.

Rob Ilic, research associate and user programme manager of Cornell Nanoscale Science and Technology Facility, added: "With more than 700 users coming to our facility annually, we do a vast amount of e-beam data preparation, and this collaboration will help us provide better service and results, as well as learn more about the future of the process."

- John Walko
EE Times Europe




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