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Vistec designs photomask CD measurement system for 45nm

Posted: 15 Mar 2007     Print Version  Bookmark and Share

Keywords:photomask  CD measurement  Vistec  Advantest  LWM9000 

Vistec's LWM9045 CD measurement system for photomasks

Vistec Semiconductor Systems has unveiled its new SEM-based Critical Dimension (CD) measurement system for photomasks. The LWM9045 is designed for the 45nm technology node photomask production and the 32nm process development.

Compared to previous-generation tools, the LWM9045 has increased measurement performance by 30 per cent, with better than 1nm long-term repeatability.

"Our customers appreciate the excellent long-term repeatability, thanks to the extremely low electron charging and practically non-existent substrate contamination," said Gerhard Schlueter, product manager at Vistec.

A new beam blanking system in the device's redesigned column helps control charging during the measurement process. The enhanced functionality of its Ozoniser enables lowest contamination rates. With a new detector capability, the scanning system, reengineered for reduced noise, promises high-precision measurement.

A highly accurate laser stage combined with software positioning corrections results in stage accuracy uncertainty of less than ±75nm. Thus, local pattern matching is avoided in most cases, achieving greater throughput and system productivity. The new GUI has been designed for ease of system operation and measurement task programming.

Like its precursor, the LWM9000, the LWM9045 is a result of Vistec's cooperation with Japan's Advantest. Vistek General Manager Gerhard Ruppik claims the company gained 75 per cent market share after two years in the market with the LWM9000.

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