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Surface characterization of semiconductor materials by AFM

Posted: 12 Sep 2001     Print Version  Bookmark and Share

Keywords:burleigh  microscope  sputtering  surface characterization  mass spectrometry 

This application note presents a comparison of roughness measurements by AFM (Atomic Force Microscope) and SEM (Scanning Electron Microscope) of silicon substrates bombarded and analyzed during SIMS (Secondary Ion Mass Spectrometry) experiments.

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