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Nikon, IME to set up joint R&D lab

Posted: 21 Dec 2012     Print Version  Bookmark and Share

Keywords:research and development  lithography  ArF Deep Ultraviolet  non-volatile memory  nanophotonics 

Nikon Corporation and Singapore-based semiconductor research institute A*STAR Institute of Microelectronics (IME) will jointly set up a research and development laboratory to develop advanced optical lithography technology used in the manufacturing of semiconductor chips.

Nikon and IME will collaborate on technologies such as multiple patterning and direct self assembly techniques to drive the extension of ArF Deep Ultraviolet (DUV) dry and immersion lithography down to geometry of 20 nm and beyond, targeting advanced applications including logic, high density memory, embedded non-volatile memory, high-speed electronics and nanophotonics, and nano-electromechanical systems (NEMS).

This collaboration will allow Nikon to tap into IME's advanced R&D infrastructure, process technology and talent pool to get early insights into its next-generation systems, which will shorten time-to-market.

"Through this collaboration with IME, Nikon will gain knowledge of future process technology and total solutions, which will be important for our lithography system development. We are very excited to partner with one of the most advanced and established institute in the Asia region," said Kazuo Ushida, president, Nikon Precision Equipment Company.

Prof. Dim-Lee Kwong, executive director, IME, added, "The joint lab is a significant milestone for advanced semiconductor R&D in Singapore."





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