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GlobalFoundries, Mentor Graphics advance ICs

Posted: 21 Oct 2009     Print Version  Bookmark and Share

Keywords:GlobalFoundries Mentor deal  lithography  EDA 

Mentor Graphics Corp. reports that it has entered into an agreement with GlobalFoundries. The multi-year software and services agreement for EDA tools seeks to advance IC development and manufacturing. As part of the agreement, GlobalFoundries adopts Mentor Graphics' Calibre platform for the design and verification of complex semiconductor devices along with computational lithography and mask data preparation flows, targeting process technologies of 32/28nm and below. GlobalFoundries will also work with the Mentor Graphics worldwide support organisation to help customers using Calibre tools as they develop new products at advanced process nodes.

"Our focus continues to be on providing the world's largest semiconductor design companies with the fastest time-to-volume production in the foundry industry," said Mojy Chian, senior VP of design enablement at GlobalFoundries. "Mentor Graphics technology and services are important additions to the robust design enablement infrastructure we have built to ensure that our customers can maximise the benefits of our technology. We chose Mentor Graphics for its leadership in physical verification and its comprehensive RET, OPC and mask data preparation solutions. The combination of Mentor's tools and our design for manufacturing capabilities will provide GlobalFoundries customers with the fastest possible time to mask."

"GlobalFoundries' partnership with Mentor constitutes a unique and far-reaching collaboration that is bringing leading-edge solutions to the world's largest fabless design companies," said Joseph Sawicki, VP and general manager for the design-to-silicon division at Mentor. "This latest effort builds on the long-standing relationships between Mentor and GlobalFoundries. It will allow GlobalFoundries customers to optimise their designs using solutions that leverage the complete Calibre offering, including the integration of lithography and CMP process models developed for Calibre and a comprehensive set of DFM design capabilities on the Calibre and Olympus-SoC tool platforms."





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