Global Sources
EE Times-India
Stay in touch with EE Times India
 
EE Times-India > Memory/Storage
 
 
Memory/Storage  

Korean IC firm adopts SEZ's Da Vinci tools

Posted: 05 Feb 2007     Print Version  Bookmark and Share

Keywords:SEZ Group  DRAM  memory  Da Vinci  polymer removal 

The SEZ Group announced that a major Korean semiconductor manufacturer has placed a multiple-system order for SEZ's Da Vinci family of tools for back-end-of-line (BEOL) polymer removal for 300mm and 200mm memory devices with sub-90nm process technologies.

The four-system order will be used for aluminium copper polymer cleans for next-generation DRAM devices and will utilise SEZ's dilute sulphuric-peroxide (DSP+) chemistry process.

According to the company, this order win is a significant milestone for as it marks its entry into this memory manufacturer's production line for BEOL cleans.

Chief operating officer for SEZ Asia Pacific, Herwig Petsching said "It not only opens the door to a new customer in the Korean market, but also further validates the Da Vinci's ability to continuously meet our customers' needs both in cost of ownership and performance."

The Da Vinci platform was developed through close collaboration with key customers, the platform combines a flexible, multi-chamber architecture with a very small footprint to deliver high throughput and accuracy, while maintaining optimal system uptime. Specifically, utilising an acidic aqueous solution like DSP+ for DRAM processes eliminates cleaning problems typically caused by solvent-based polymer removers, which is particularly critical as device geometries continue to shrink and delivery windows tighten.




Comment on "Korean IC firm adopts SEZ's Da Vinci..."
Comments:  
*  You can enter [0] more charecters.
*Verify code:
 
 
Webinars

Seminars

Visit Asia Webinars to learn about the latest in technology and get practical design tips.

 

Go to top             Connect on Facebook      Follow us on Twitter      Follow us on Orkut

 
Back to Top