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Surface characterization of semiconductor materials by AFM

Posted: 12 Sep 2001     Print Version  Bookmark and Share

Keywords:burleigh  microscope  sputtering  surface characterization  mass spectrometry 

This application note presents a comparison of roughness measurements by AFM (Atomic Force Microscope) and SEM (Scanning Electron Microscope) of silicon substrates bombarded and analyzed during SIMS (Secondary Ion Mass Spectrometry) experiments.

View the PDF document for more information.



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